The Plasma Quest Ltd HiTUS patented remotely generated plasma thin film deposition technology is a major evolution from the traditional magnetron technology widely used in industrial and research circles.

The essential factor of PQL’s leading edge thin film deposition coating technology is a remotely generated high intensity plasma that gives a number of important benefits that are unavailable from magnetron, ion beam, thermal evaporation and chemical vapour deposition coating systems. Furthermore, PQL’s thin film sputtering technology has delivered a variety of superior coating characteristics for the photonic, semiconductor, and photovoltaic sectors.

In all cases the HiTUS process delivers very high quality thin film materials with near ideal physical properties, very low stress and excellent adhesion – whether on metal, glass or plastic substrates.

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Below is a one page description of the PQL technology:

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