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High rate deposition from thick (6mm+) ferromagnetic targets.
Deposition of dielectric materials for multi layer optical filters, mirrors and waveguides.
Low temperature deposition of electronic quality materials onto plastic and other ‘delicate’ substrates. High rate and very low rate deposition of near bulk property Alumina. Very dense films deposited using PQL’s HiTUS technology have demonstrated enhanced protective and wear resistant properties. PQL’s sputter deposition technology offers an attractive alternative, with commercial benefits having already been demonstrated. The ability to direct the plasma onto the substrate enables the substrate to be cleaned of volatile materials. HiTUS offers beneficial characteristics for thin film membranes compared to many other marketplace solutions
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