Our Force/Strengths
Remotely Generated Plasma:
We have independent control of all process parameters including target voltage and ion current
Low Temperature Process:
Low temperature deposition for plastic or other 'delicate' substrates
Stable High Rate Reactive Process:
Virtual elimination of target poisoning since the surface of the target is uniformly eroded.
Stress Control:
Due to our unique process we are able to control the stress if growing thin films from compressive through to tensile.
Potential for Multilayer Devices:
PQL systems have the ability to deposit multilayer without breaking vacuum
Thick ferromagnetic targets:
Ability to sputter from thick ferromagnetic targets
Substrate plasma-cleaning:
Offering enhanced adhesion performance
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Electroluminescence Devices |
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Due to the excellent PL results, the ZnS:Mn films have also been incorporated into electroluminescent (EL) devices on silicon, glass and polymeric substrate materials. The standard double insulating layer structure has been adopted with the ZnS:Mn being sandwiched between two dielectric layers.
Completely transparent structures,
Various dielectric materials consisting of Y2O3, Ta2O5, Al2O3 and AlN have been investigated
No substrate heating or post deposition annealing
A turn on voltage of 122 V (RMS)
Maximum luminance of 75 Cdm-2 at approximately 195 V (RMS).
Optical transparency is 95%.
A complete, working device with a thickness of 1.8 um can be deposited in just over 30 minutes.
Due to the excellent PL results, the ZnS:Mn films have also been incorporated into electroluminescent (EL) devices on silicon, glass and polymeric substrate materials. The standard double insulating layer structure has been adopted with the ZnS:Mn being sandwiched between two dielectric layers.
- Completely transparent structures
- Various dielectric materials consisting of Y2O3, Ta2O5, Al2O3 and AlN have been investigated
- No substrate heating or post deposition annealing
- A turn on voltage of 122 V (RMS)
- Maximum luminance of 75 Cdm-2 at approximately 195 V (RMS).
- Optical transparency is 95%.
- A complete, working device with a thickness of 1.8 um can be deposited in just over 30 minutes.
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Strategic Materials
Metals:
Ag, Al, Au, Bi, Co, Cr, Cu, Fe, Hf, In, Mg, Mn, Mo, Nb, Ni, Pb, Pt, Sn, Ta, Ti, W, Y, Zn, Zr
Dielectrics:
AlN, Al2O3, PbO, SiO2, Ta2O5, NbO5, TiO2, TixO2x-1, TiN, HfO2, CuO, In2O3, MgO
(Oxy-Nitrides and sub-oxides are also possible with PQL technology)
Transparent conducting oxides:
Sn:InO (ITO), In:ZnO(IZO), Al:ZnO (AZO), ZnO
Magnetic materials:
Co, CoFe, Fe, NiFe
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