Our Force/Strengths

Remotely Generated Plasma:

We have independent control of all process parameters including target voltage and ion current

Low Temperature Process:

Low temperature deposition for plastic or other 'delicate' substrates

Stable High Rate Reactive Process:

Virtual elimination of target poisoning since the surface of the target is uniformly eroded.

Stress Control:

Due to our unique process we are able to control the stress if growing thin films from compressive through to tensile.

Potential for Multilayer Devices:

PQL systems have the ability to deposit multilayer without breaking vacuum

Thick ferromagnetic targets:

Ability to sputter from thick ferromagnetic targets

Substrate plasma-cleaning:

Offering enhanced adhesion performance

HiTUS in action

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Waveguide Materials PDF Print E-mail
PQL has deposited high quality waveguiding alumina layers that appeared to be unaffected by ultraviolet irradiation – a requirement for the "next generation" of upconversion lasers using thulium as the active laser ion.
We have achieved excellent results through reactive sputtering:
High deposition rate of High quality alumina
RI very near to bulk properties
Zero breakdown
Very low stress films (controlled through process conditions)
Deposition onto plastic and delicate substrates
Also low rate deposition
UV stable

PQL has deposited high quality waveguiding alumina layers that appeared to be unaffected by ultraviolet irradiation – a requirement for the "next generation" of upconversion lasers using thulium as the active laser ion.

We have achieved excellent results through reactive sputtering:

  • High deposition rate of High quality alumina
  • RI very near to bulk properties
  • Zero breakdownVery low stress films (controlled through process conditions)
  • Deposition onto plastic and delicate substrates
  • Also low rate deposition
  • UV stable
 

Strategic Materials

Metals:

Ag, Al, Au, Bi, Co, Cr, Cu, Fe, Hf, In, Mg, Mn, Mo, Nb, Ni, Pb, Pt, Sn, Ta, Ti, W, Y, Zn, Zr

Dielectrics:

AlN, Al2O3, PbO, SiO2, Ta2O5, NbO5, TiO2, TixO2x-1, TiN, HfO2, CuO, In2O3, MgO

(Oxy-Nitrides and sub-oxides are also possible with PQL technology)

Transparent conducting oxides:

Sn:InO (ITO), In:ZnO(IZO), Al:ZnO (AZO), ZnO

Magnetic materials:

Co, CoFe, Fe, NiFe