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HiTUS - cutting edge plasma thin film deposition / sputtering technology |
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The Plasma Quest Ltd HiTUS patented remotely generated plasma thin film deposition technology is a major evolution from the traditional magnetron technology widely used in industrial and research circles.
Our sputtering (physical vapor / vapour deposition) process is based on Remote High Density Plasma, generated in a side chamber opening into the main process chamber. This provides additional features - Precision, Stability, Reproducibility, Stress Control among others – which when integrated together leads the way for the development of new process.
Below is a one page  description of the PQL technology:
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