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Plasma Quest's technology offers a high degree of reproducibility, therefore providing a perfect solution for machines used in mass production. An all-in-one or integrated solution, Plasma Quest offers the flexibility to cater the needs of both its R&D and industrial clients.
 Linear Target
PQL’s continuing development of its ‘Linear Target’ System has provided another breakthrough result when the 50cm cylindrical target was tested for the first time this month.
Results have confirmed that plasma generation efficiency is maintained along the length of the target, providing a uniform plasma density for high rate sputtering from the whole target surface.
Substantial in-house R&D over the last year has shown that this configuration has many benefits:
- More efficient use of plasma source
- Eliminates need to scale source with target
- Greatly increased coating area
- Greatly increased coating rates
- Retains all HiTUS advantages – improves reactive stability.
Sidearm Plasma Launch Systems (PLS)
PQL’s sidearm technology can be purchased as a straightforward and cost effective upgrade to existing thin film deposition systems to reap the benefits of deploying PQL’s Hi Target Utilisation Sputtering (HiTUS) technology.
Contact PQL to learn how integrating HiTUS with your existing sputtering deposition system will improve processes such as metal and dielectric sputtering; reactive sputter coating; Plasma etch; PECVD.
The HiTUS Plasma Launch System is available with 100mm and 150mm plasma launch tube.
Multiple Target Holder
The combination of PQL’s Sidearm Plasma Launch System and Multiple Target Holder provides the capability to selectively sputter thin films from any one of up to eight materials repeatedly and reliably. With the advantage of only requiring one bias power supply this is an ideal tool for both R&D establishments and for the production of multi layer thin film coatings.
As with the Sidearm Plasma Launch System, PQL’s Multiple Target Holder is readily integrated into existing vacuum systems.
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