The HiTUS technology is the culmination of many years of research and development, and has now been proven to offer substantial process enhancements and efficiencies. In particular the deposition rates, target utilisation, and high quality films enable significant cost savings to be made when compared to more conventional processes.  Additionally the HiTUS process technology ENABLES areas to be addressed that are not possible through the more conventional processes.

If a multilayer structure is to be deposited then HiTUS could be cheaper than magnetron, as we use a target holder with up to 6 targets and only one power supply, whereas magnetron would use a magnetron source and a power supply for each target.