Our Force/Strengths
Remotely Generated Plasma:
We have independent control of all process parameters including target voltage and ion current
Low Temperature Process:
Low temperature deposition for plastic or other 'delicate' substrates
Stable High Rate Reactive Process:
Virtual elimination of target poisoning since the surface of the target is uniformly eroded.
Stress Control:
Due to our unique process we are able to control the stress if growing thin films from compressive through to tensile.
Potential for Multilayer Devices:
PQL systems have the ability to deposit multilayer without breaking vacuum
Thick ferromagnetic targets:
Ability to sputter from thick ferromagnetic targets
Substrate plasma-cleaning:
Offering enhanced adhesion performance
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Sidearm Plasma Launch Systems (PLS) |
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PQL's sidearm technology can be purchased for integration or retro-fit with client's vacuum deposition system. Contact PQL to learn how integrating our technology with your existing sputtering deposition system will improve processes such as metal and dielectric sputtering; reactive sputter coating; Plasma etch; PECVD.
The Plasma Launch System is available with 100mm and 150mm plasma launch tube.
PQL's sidearm technology can be purchased for integration or retro-fit with client's vacuum deposition system. Contact PQL to learn how integrating our technology with your existing sputtering deposition system will improve processes such as metal and dielectric sputtering; reactive sputter coating; Plasma etch; PECVD.
The Plasma Launch System is available with 100mm and 150mm plasma launch tube.
Upgrades:
It should be recognised that HiTUS systems, whilst appearing simple in construction, have complex process technologies underpinning them. It is this process expertise that enables PQL to offer its Clients a significantly enhanced product than if the Client chooses to attempt a system build.
Notwithstanding this, PQL does supply the Plasma Launch System (PLS) which is the heart of the technology as a stand alone “component” for integration into a Client’s vacuum chamber. In such instances PQL will work closely with the Client to maximise the opportunity to have a successful system build.
It should also be noted that the final COST of such a chosen route may well be higher than the purchase of a full upgrade as designed and supplied by PQL.
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Strategic Materials
Metals:
Ag, Al, Au, Bi, Co, Cr, Cu, Fe, Hf, In, Mg, Mn, Mo, Nb, Ni, Pb, Pt, Sn, Ta, Ti, W, Y, Zn, Zr
Dielectrics:
AlN, Al2O3, PbO, SiO2, Ta2O5, NbO5, TiO2, TixO2x-1, TiN, HfO2, CuO, In2O3, MgO
(Oxy-Nitrides and sub-oxides are also possible with PQL technology)
Transparent conducting oxides:
Sn:InO (ITO), In:ZnO(IZO), Al:ZnO (AZO), ZnO
Magnetic materials:
Co, CoFe, Fe, NiFe
News @ PQL
13 May 2010 - Site Update We have begun updating site content, that will involve adding and removing obsolete content and documentation from the site and enhancing use of the blog to keep site visitors up to date on developments at PQL. Thank you for your patience as we proceed with the update. We will keep the site online during this process.
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