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S400 Thin Film Sputter Deposition Systems
PQL’s HiTUS Technology is available as either complete coating systems or modules for cost effective upgrade of existing sputter systems.
PQL’s High Target Utilisation Sputtering (HiTUS) technology facilitates quality thin film coating s not achieved from conventional deposition systems. Commerce and academia use HiTUS because of the inherent advantages of using externally generated plasma to deposit materials. Many of the known deficiencies of Magnetron, Ion Beam and Chemical Vapour Deposition systems are overcome by HiTUS, for example, HiTUS accommodates thick ferro magnetic material, full target erosion is achieved therefore improving productivity and material wastage, coating onto organic substrates is as effective as non organic materials. HiTUS delivers exceptional film properties while facilitating very low and high deposition rates. HiTUS is becoming recognised globally as sputtering technology that is redefining what can be attained in the thin film arena.
S400 sputter systems also feature:-
- Fully automated control
- Individually designed and manufactured to meet customer requirements and budgets
- selectively sputter from any one of up to eight materials when combined with PQL’s Multiple Target Holder
- Large area and multiple substrate capability
Sidearm Plasma Launch Systems (PLS)
PQL’s sidearm technology can be purchased as a straightforward and cost effective upgrade to existing thin film deposition systems to reap the benefits of deploying PQL’s Hi Target Utilisation Sputtering (HiTUS) technology.
Contact PQL to learn how integrating HiTUS with your existing sputtering deposition system will improve processes such as metal and dielectric sputtering; reactive sputter coating; Plasma etch; PECVD.
The HiTUS Plasma Launch System is available with 100mm and 150mm plasma launch tube.
Useful links:
HiTUS materials database document
Brochure S400
Information Request Form
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